Sputter deposition normally occurs at a pressure of 10-3 Torr; therefore, the coating is more conformal compared to electron beam deposition.

In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the manufacture of electronic components, and are key materials for the preparation of surface ...

Breaking Taps Precision Stencils: Laser Etching for Vapor Deposition! Posted: February 4, 2025 | Last updated: February 4, 2025 Shadow masks! We're making micro stencils to use in my sputter ...

The team has just determined that its approach – involving plasma nitridation of the SiC surface, sputter deposition of SiO 2, and post-deposition annealing – reduces the interface state density near ...

Transfer Engineering provides products for OEM, Production R&D/University Lab customers in Semiconductor, Media, Sputter Deposition and R&D markets. TEAMs core expertise is in the transporting and ...

These systems are built around AJA's unique A300-XP (UHV) or Stiletto Series (HV) magnetron sputtering sources which feature in-situ source head tilting allowing precise and repeatable con-focal, ...