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Plasma technique doubles etch rate for 3D NAND flash memoryUsing plasma to create deep, narrow channels "These processes ... One recent development involves keeping the wafer––the ...
This groundbreaking technique, also referred to as MacEtch or MACE, provides ultra-high anisotropy etching that’s free from damage. It is an innovative approach that effectively addresses the ...
A surprising discovery reveals that carbon nanotubes made from CO2 spontaneously create intense, stable plasma in ordinary ...
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What is the Role of Fine Ceramics in Semiconductor Manufacturing?The process of manufacturing semiconductors incorporates stringent conditions where plasma is generated. Plasma corrosion resistance is therefore a crucial attribute for components involved in ...
With the right wastewater treatment strategies, companies can address these challenges while advancing their sustainability ...
A research team presents an AI assessor for Hall-effect ion thrusters, the engines of satellites and space probes.
To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...
Advancements and Projections in the Global DC Plasma Excitations Market: Insights, Trends, Opportunities, and Recent DevelopmentsNew York, Jan. 27, 2025 (GLOBE NEWSWIRE) -- Overview The Global DC ...
The sellers comprise Pontex Investment Partners (Pontex), a private equity firm and current investor, as well as Leo Meijer ...
The team has just determined that its approach – involving plasma nitridation of the SiC surface, sputter deposition of SiO 2, and post-deposition annealing – reduces the interface state density near ...
While demands from highly advanced industries like semiconductors and aerospace are increasing, developments in plasma stability and energy efficiency are going on within the US DC plasma ...
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