The team has just determined that its approach – involving plasma nitridation of the SiC surface, sputter deposition of SiO 2, and post-deposition annealing – reduces the interface state density near ...

Dusty plasma is plasma containing small particles in suspension. In industry, dust is a contaminant and this is a motivation for its removal from semiconductor processing ... and by photoelectric ...

A surprising discovery reveals that carbon nanotubes made from CO2 spontaneously create intense, stable plasma in ordinary ...