Phys.org on MSN12d
Plasma technique doubles etch rate for 3D NAND flash memoryTo store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...
17d
tom's Hardware on MSNChinese semiconductor production equipment makers set sales recordsSales of China-based makers of chipmaking tools AMEC, Naura, and ACM Research expect record sales in 2024 amid curbs for Western companies to supply to China.
To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...
AlixLabs AB, a Swedish semiconductor startup specialising in Atomic Layer Etching (ALE), announces that it has entered a ...
The sellers comprise Pontex Investment Partners (Pontex), a private equity firm and current investor, as well as Leo Meijer ...
This groundbreaking technique, also referred to as MacEtch or MACE, provides ultra-high anisotropy etching that’s free from damage. It is an innovative approach that effectively addresses the ...
The narrow, deep holes required for one type of flash memory are made twice as fast with the right recipe, which includes a plasma made from hydrogen fluoride.
The chemical etching process he used is a bit fussy, and prone to undercutting of the mask if the etchant seeps underneath it. As its name implies, RIE uses a plasma of highly reactive ions to do ...
Advancements and Projections in the Global DC Plasma Excitations Market: Insights, Trends, Opportunities, and Recent DevelopmentsNew York, Jan. 27, 2025 (GLOBE NEWSWIRE) -- Overview The Global DC ...
An artist’s representation of a hole etched into alternating layers of silicon oxide and silicon nitride using plasma ... equipment and services to chipmakers. Doubling etch rates When silicon ...
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