To store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...

To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...

Plasma etching and atomic layer etching (ALE) are critical processes in the fabrication of semiconductor devices, particularly as the industry moves towards smaller and more complex structures.

Research has also delved into the use of plasma techniques for atomic layer etching. For example, a study on molybdenum etching involved a two-step process of plasma oxidation followed by ...

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plasma power, and treatment time, to minimize oxidation while maximizing surface energy. X-ray photoelectron spectroscopy (XPS) was employed to calculate the Cu atomic percentage (at%) at the surface ...

etching. Fabrication of the MIS structure on the opening of the P-GaN gate region by OTALD technology started with the thermal oxidation treatment. Followed by a 5 nm Al 2 O 3 dielectric layer ...