The Fraunhofer Institute for Photonic Microsystems IPMS, in collaboration with DIVE imaging systems GmbH, has achieved a major milestone in resource-efficient semiconductor manufacturing. With the ...

In plasma etching process, various physical and chemical mechanisms affect the feature profile evolution. The relative importance of these mechanisms is uncertain. In order to study the physics ...

Prepare to be amazed by the incredible restoration of this rusty hammer as it gets transformed into a masterpiece. What happens when a worn-out hammer meets expert techniques like sandblasting, ...

Cleaning your engine bay can seem intimidating, but with the right approach, it’s safe, effective, and an excellent part of overall car care. A clean engine bay is more than cosmetic. It helps spot ...

Sixty-five years after it first hit store shelves, the iconic, red-framed drawing toy continues to enchant kids, artists, and ...

Fully cell-free process aims to democratize personalized cancer therapeutics with shorter turnaround and negligible bioburden ...

Researchers at NYU Tandon have developed a new method for synthesizing metallic glass nanoparticles that offers refined ...

Characterization of the wet etching process for an InGaAs epitaxy layer using surface profiling technique is reported. Surface profiling technique allows a 2D reconstruction view of the etched regions ...