The Fraunhofer Institute for Photonic Microsystems IPMS, in collaboration with DIVE imaging systems GmbH, has achieved a major milestone in resource-efficient semiconductor manufacturing. With the ...

In plasma etching process, various physical and chemical mechanisms affect the feature profile evolution. The relative importance of these mechanisms is uncertain. In order to study the physics ...

Step inside the renowned Beretta factory to uncover the meticulous process behind the creation of world-class firearms. Ever ...