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The white paper discusses how Atomera's MST® technology can be used to control dopant diffusion in layers thinner than 5nm, meeting key requirements for advanced 3D devices.
During an email interview, Atomera founder and CTO Robert Mears discussed how dopant diffusion affects chipmaking and options for delving into the dopant diffusion process to accomplish gate-all ...
Thermal diffusion doping involves placing a source of dopant atoms (phosphorus or boron in this case) on top of the chip to be doped, heating the chip, and letting the dopant atoms diffuse into ...
One of the critical challenges to forming 65-nanometer transistors is controlling the diffusion of dopants used to form the source and drain extensions. During the post-implant anneal step, the ...
A hobbyist-developed spin-on glass dopant offers a cost-effective alternative to commercial semiconductor doping techniques.
Researchers have obtained the first direct observations of atomic diffusion inside a bulk material. The research could be used to give unprecedented insight into the lifespan and properties of new ...
Through methods such as ion implantation combined with rapid thermal and laser annealing, researchers are addressing the challenges of dopant diffusion, defect repair, and electrical activation.
In the study, the researchers used a scanning transmission electron microscope to observe the diffusion processes of cerium and manganese dopant atoms.
5" quatz tube furnaces that can go up to 1200 degrees Celcius with pure gases (oxygen, hydrogen, argon, forming gas, nitrogen) for thermal anneal, graphene growth, Si thermal oxidation, and dopant ...
LONDON Innos is to work with the University of Southampton to research novel methods of dopant diffusion suppression in semiconductors. The joint research follows the award of a five-year research ...
[Zach]’s doping method is a more localized version of the simple thermal diffusion method, which drives a dopant like phosphorus into silicon using high temperatures, but instead of using a tube ...
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