We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first ...

10×100-micron TSV was prepared by deep reactive ion etching process. Barrier and seed layer were deposited by physical vapor deposition process and prior to Cu electroplating, Ni was electroplated on ...

Not generally given to hyperbole, when Rolex describes the regulator of calibre 7135 - which powers the Land-Dweller unveiled ...