Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...

Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...

Atomic Layer Deposition (ALD) is a highly controlled technique used to create thin films, particularly silicon nitride (SiNx), which is essential in various microelectronic applications.

Atomic Layer Deposition (ALD) is a sophisticated technique used to create thin films with exceptional precision and uniformity. This method has gained significant attention in recent years due to ...

The new machine, known as a plasma-enhanced atomic layer deposition machine, or PE-ALD tool, is made by a British company called Oxford Instruments Plasma Technology. Computer chips are made ...

Class A shares underperformed the MSCI Europe Index for the quarter. The leading detractors from relative return were stock ...

Advances in synthesis methods such as sol-gel processes, microwave-assisted synthesis, and atomic layer deposition have ...

The integration of ALE with other nanofabrication techniques, such as atomic layer deposition (ALD) and nanoimprint lithography, will enable the creation of complex, multi-material structures with ...

Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...

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Researchers at the University at Albany’s College of Nanotechnology, Science, and Engineering now have access to a new fabrication system capable of manipulating microchip designs at the atomic level.