Critical Dimension Scanning Electron Microscopy (CD-SEM) is a specialized technique used for high-resolution imaging and precise measurement of nanoscale structures in semiconductor manufacturing and ...
A technical paper titled “SEMI-PointRend: Improved Semiconductor Wafer Defect Classification and Segmentation as Rendering” was published (preprint) by researchers at imec, University of Ulsan, and KU ...
After cleaning with the Solarus II system, amorphous surface damage and crosslinking are eliminated. Protocol: hydrogen and oxygen; duration: 5 min; sample: a semiconductor device; SEM image.
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