The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. "Cryo etch with the hydrogen fluoride plasma showed ...

For a lot of reasons, home etching of PCBs is somewhat of a dying art. The main reason is the rise of quick-turn PCB fabrication services, of course; when you can send your Gerbers off and receive ...

In a conventional plasma etching chamber, the incident ions bombard the surface and etch holes normal to the surface; angled etching is not possible even when the surface is tilted. To overcome ...

Both capacitively (RIE) and inductively (ICP) coupled plasma etcher with fluorine-based gases (CF4, CHF3, C4F8, SF6), BCl3, nitrogen, argon, and oxygen for anisotropic dry etching of Si-based ...

innovative technical solutions from partners are needed to develop more powerful and new semiconductor devices," adding that "plasma etching technology will play a key role in next-generation ...

Through via hole fabrication process by deep reactive-ion etching (DRIE): (a) Sample cleaning; (b) Deposition of mask material; (c) Transfer of desired pattern; (d) Desired pattern achieved; (e) ...

During the fabrication process, we need to etch out the unwanted oxide layer from the wafer, which can be done using plasma etching. Plasma contains high energetic ions and radicals for etching that ...

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...

Akara® Solves Key Scaling Challenges for Chipmakers, with Unique Plasma Control Capabilities and a Suite of Proprietary New Technologies; Extends 20 years of Conductor Etch Leadership FREMONT, Calif.

FREMONT, Calif., Feb. 19, 2025 /PRNewswire/ -- Lam Research Corp. (Nasdaq: LRCX) today introduced Akara®, a breakthrough innovation in plasma etch and the most advanced conductor etch tool available.