Phys.org on MSN11d
Plasma technique doubles etch rate for 3D NAND flash memoryTo store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...
To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...
Advancements and Projections in the Global DC Plasma Excitations Market: Insights, Trends, Opportunities, and Recent DevelopmentsNew York, Jan. 27, 2025 (GLOBE NEWSWIRE) -- Overview The Global DC ...
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The narrow, deep holes required for one type of flash memory are made twice as fast with the right recipe, which includes a plasma made from hydrogen fluoride.
AlixLabs AB, a Swedish semiconductor startup specialising in Atomic Layer Etching (ALE), announces that it has entered a ...
Plasma etching and atomic layer etching (ALE) are critical processes in the fabrication of semiconductor devices, particularly as the industry moves towards smaller and more complex structures.
Electricity is chaotic, and we normally need to constrain it to wires and circuits to make use of it. Scientists in Europe and Canada have now managed to guide sparks through thin air and even around ...
This groundbreaking technique, also referred to as MacEtch or MACE, provides ultra-high anisotropy etching that’s free from damage. It is an innovative approach that effectively addresses the ...
The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. “Cryo etch with the hydrogen fluoride plasma ...
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