ITER is building a boronisation system requiring over 1 km of gas injection lines to reduce plasma impurities.

In the semiconductor manufacturing process, etching equipment can be regarded as the core equipment, and ceramic cavities are ...

Discover how 4D digital holographic microscopy enables non-invasive topography measurements of liquid and soft matter ...

The founder and CEO of the facility where a 5-year-old boy was killed in a hyperbaric chamber explosion appeared in court on Monday for a motion hearing about the use of a taint team in this case.

DirectDrive generates plasma with 100x faster responsiveness than previous sources, resulting in fewer patterning defects during chip making.

How chemistry and force etch mysterious spiral patterns on solid surfaces Hundreds of regular patterns spontaneously form on a small germanium chip Date: March 15, 2025 Source: University of ...

Researchers have developed a hydrogen fluoride plasma technique that doubles the etching rate in the manufacturing process of 3D NAND flash memory chips.

A nuclear fusion reactor in China, dubbed the "artificial sun," has broken its own record to bring humanity one step closer ...

These considerations mean that plasma etching demands great accuracy in plasma analysis. Optical emission spectroscopy—commonly across the near-infrared to near-ultraviolet regions of the ...