ITER is building a boronisation system requiring over 1 km of gas injection lines to reduce plasma impurities.

This paper reports research performed on developing and optimizing a process recipe for the plasma etching of deep high-aspect ratio features into silicon carbide (SiC) material using an ...

In the semiconductor manufacturing process, etching equipment can be regarded as the core equipment, and ceramic cavities are ...

It is well known that wafer temperature has significant impact on plasma etching performance. Instability of (peak) wafer temperatures during process can be linked to such issues as post-metal etch ...

Discover how 4D digital holographic microscopy enables non-invasive topography measurements of liquid and soft matter ...

This study investigates the use of radio frequency air plasma as an eco-friendly method to rapidly and reversibly tailor the surface properties of graphene oxide (GO) films. We observed a transition ...