Silicon wafers aren't the only things that lose material in the various etching steps of IC manufacturing. The clamp rings which hold the wafers also erode during the process. Plastic clamp rings are ...

Trikon Technologies Inc. of Newport, Wales, today introduced two plasma etch products aimed at the silicon and compound semiconductor markets. Trikon (nasdaq: TRKN) debuted the Omega fxP ...

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...

AUSTIN, Texas — Tokyo Electron Ltd. (TEL) has improved the design of the SCCM (Super Capacitively Coupled Module) plasma etch chamber, the company claimed Monday (Dec. 13). The focus ring and ...

TOKYO--(BUSINESS WIRE)--July 10, 2006--Tokyo Electron (TEL), the world leader in dielectric etch, announced today the release of UNITY(R) LS, equipped with TEL's award-winning DRM chamber, a MERIE ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

FREMONT, CA--(Marketwired - July 14, 2015) - Mattson Technology, Inc. (MTSN), a leading supplier of advanced wafer fabrication equipment used by semiconductor manufacturers, today announced that it ...

The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...

New research paper entitled “Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement” from TEL Technology Center, Americas and IBM ...

Quadrupole mass-spectroscopy has reported significant neutral and ionic species in the unique C 5 HF 7 /O 2 /Ar plasma, including C x F y (X>2), C x HF y, and C x F y (Y/X<2). Using C 5 HF 7 /O 2 /Ar ...