Standard NAND flash storage is used in microSD cards, USB drives, and solid-state drives in computers and phones. To fit more gigabytes into smaller spaces, manufacturers ...

Researchers find a faster way to etch deep holes for 3D NAND Plasma-based cryo-etching technique doubles etch speed, ...

Discover how photo chemical etching ensures burr-free surgical instruments with unmatched precision. Read more now!

To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...

Key Market Drivers .Growing Demand in Manufacturing: Increased adoption of laser etching technology across industries like automotive, aerospace, and electronics for precision marking and etching ...

As part of the APECS pilot line, the area of dry etching technology in the Fraunhofer IAF clean room for 6’’ wafers is being expanded.

ALE has emerged as a crucial technology for advanced nanofabrication, enabling the creation of ultra-thin films, high-aspect-ratio structures, and complex 3D architectures. Schematic representation of ...

As manufacturers face increasing pressure to deliver high-performance, complex components with minimal lead times, ...

However, the process, known as reactive ion etching, isn't fully understood and could be improved. One recent development involves keeping the wafer––the sheet of semiconductor material to be ...

ALE of MoS 2 shows no Raman defect peak after etching, highlighting the low damage etching capabilities of ALE. Image Credit: Oxford Instruments Plasma Technology 25 nm wide Si trenches etched to 110 ...