One option for combating a scaling-induced hike in leakage current is to insert a high -κ dielectric between the gate metal ...
The team has just determined that its approach – involving plasma nitridation of the SiC surface, sputter deposition of SiO 2, and post-deposition annealing – reduces the interface state density near ...
Exploiting the dual-gated MoS 2 memtransistors for neural processing ... quadratic multiplications within a memtransistor crossbar are ∼ 1.5 × more energy efficient than in memristors. Furthermore, by ...
Department Structure and Dynamics of Energy Materials, Helmholtz-Zentrum-Berlin, Hahn-Meitner-Platz 1, D-14109 Berlin, Germany ...
POLYMAT, Applied Chemistry Department, Faculty of Chemistry, University of the Basque Country UPV/EHU, Manuel Lardizabal Pasealekua, 3, 20018 San Sebastián, Spain ...