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Phys.org on MSN10d
Plasma technique doubles etch rate for 3D NAND flash memoryTo store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...
Challenges like higher selectivity and precise etching are critical for angstrom-scale IC production. Advanced RF pulsing and plasma control enhance precision in sub-nanometer processes.
This groundbreaking technique, also referred to as MacEtch or MACE, provides ultra-high anisotropy etching that’s free from damage. It is an innovative approach that effectively addresses the ...
To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...
AI and AR are transforming industrial IoT by enabling real-time data processing, enhancing operational efficiency, and ...
Teledyne’s TDSW050A2T wideband RF switch operates from DC to 50 GHz with low insertion loss and high isolation.
The device, currently in development, integrates cutting-edge RF technology to deeply stimulate collagen regeneration, providing firming and anti-aging effects. During the conference, attendees ...
marking the company's official entry into the RF field. The device, currently in development, integrates cutting-edge RF technology to deeply stimulate collagen regeneration, providing firming and ...
In the wake of AI, unprecedented demand for data and computing power is outstripping capabilities. This will drive the ...
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