Not generally given to hyperbole, when Rolex describes the regulator of calibre 7135 - which powers the Land-Dweller unveiled ...

Making microchips for our electronics means doing some pretty detailed work. A big part of that is something called etching ...

A novel hydrogenation-assisted deep reactive ion etching of silicon is reported. The process uses sequential hydrogen-assisted passivation and plasma etching at low-density plasma powers to stimulate ...

Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride. Journal of Vacuum Science & Technology A, 2024; 42 (6) DOI: 10.1116/6.0004019 ...

However, the process, known as reactive ion etching, isn’t fully understood and could be improved. One recent development involves keeping the wafer –– the sheet of semiconductor material to ...

It cannot be used to fill deep holes or trenches (figure 1a). To form isolated wire shapes, a uniform Cu layer must be deposited on a flat surface and then physically etched by ion beams. Cu forms no ...

All dry etching processes operate in a vacuum, with pressure determining the character of the etch phenomena to some degree. Plasma etching is another significant etching method. Plasma etching ...

Deep reactive-ion etching, developed for micro-electromechanical systems (MEMS), is now also used to make silicon watch parts that have transformed watchmaking thanks to their anti-magnetic ...