Photolithography uses light to transfer a pattern of features from a mask to a light-sensitive chemical photoresist on a semiconductor wafer. As the pattern is transferred, it is reduced in scale ...
The Benefits Of Curvilinear Full-Chip Inverse Lithography Technology With Mask-Wafer Co-Optimization
A technical paper titled “Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer ...
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