Senior Researcher Ho Jin Ma from KIMS stated, "In semiconductor processes, plasma etching is dominated by ... by the Korea Institute of Materials Science (KIMS) and Professor Jeong-Woo Lee's ...

The Korea Research Institute of Standards and Science (KRISS ... European Ceramic Society. The plasma process involves precisely etching the surface of a semiconductor substrate or depositing ...

Curiosity about a mistake that left tiny dots on a germanium wafer with evaporated metal films led to the discovery of beautiful spiral patterns etched on the surface of the semiconductor by a ...

Inspired by the feet of the gecko lizard, researchers have tweaked a conventional plasma etching chamber so that it can make reusable adhesives that could have applications in the semiconductor ...

Researchers from Singapore’s Nanyang Technological University and its Agency for Science, Technology and Research are ...

Anisotropic wet etching is a common method for fabricating nanowires from various materials, such as silicon, germanium, or III-V semiconductors. By using etchants with high selectivity for specific ...

Lam Research announced on the 11th the launch of its etching equipment, 'Akara,' which can be applied to the three-dimensional (3D) semiconductor manufacturing process. According to Lam Research ...