SEMATECH today announced its Top Technical Challenges for 2006, continuing to underscore advanced gate stack, 193 nm immersion and EUV lithography, mask infrastructure, and low-k dielectrics with ...
SEMATECH and Cabot Microelectronics Collaborate to Accelerate Chemical Mechanical Planarization Tech
ALBANY, N.Y.--(BUSINESS WIRE)-- SEMATECH today announced that Cabot Microelectronics Corporation (NAS: CCMP) , the world's leading supplier of chemical mechanical planarization (CMP) polishing ...
Pushed by the scaling limits of silicon-based devices, Sematech engineers have launched a project to investigate alternative materials to Si in MOSFET channels, the critical pathways that allow ...
ALBANY, N.Y.--(BUSINESS WIRE)--SEMATECH’s 3D Enablement Center (3D EC), together with the Semiconductor Industry Association (SIA) and Semiconductor Research Corporation (SRC), has identified the top ...
ALBANY, N.Y.--(BUSINESS WIRE)--This year, SEMATECH, the international consortium of leading semiconductor device, equipment, and materials manufacturers, observes its 25 th anniversary and celebrates ...
Sematech will move the bulk of its remaining operations from Austin, TX to Albany starting in January, bringing at least 100 new jobs to the area, company officials have told the Business Review.
Industrial gas giant Air Products & Chemicals Inc. (APD) has collaborated with SEMATECH and joined the latter's Front End Processes (FEP) program to assess advanced materials and technologies for the ...
SEMATECH experts reported on innovative approaches to realize advanced CMOS logic and memory device technologies and 3D through-silicon via (TSV) manufacturing at the International VLSI Technology, ...
AUSTIN, Texas — F. Scott Fitzgerald said there are no second acts in American lives, but International Sematech doesn't believe it. The chip-making research consortium, which began operations here 15 ...
(Nanowerk News) SEMATECH announced today that its Surface Preparation and Cleaning Conference (SPCC), the premier technical forum for discussion of the latest innovations in wafer and mask-cleaning ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results