What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

Reactive Ion Etch (RIE) is a physical etch process. A rich plasma has been made just above the wafer, and the ions are expedited toward the surface to generate a highly powerful anisotropic etch.

This room also has the following resources: The Trion ICP/RIE Etch PHTII-4301 (TRION) is a reactive ion etcher with the addition of a inductively coupled plasma to achieve a high density plasma for ...

This groundbreaking technique, also referred to as MacEtch or MACE, provides ultra-high anisotropy etching that’s free from damage. It is an innovative approach that effectively addresses the ...

At least that’s [Sam]’s plan, which his new reactive-ion etching setup aims to make possible. While his Z1 dual differential amplifier chip was a huge success, the photolithography process he ...

It's worth noting that wet etching differs from dry etching techniques, such as reactive ion etching (RIE), which use plasma to remove material from a substrate. While both techniques are used in ...

To obtain anisotropic profiles, the DSiE technique or the Deep Reactive Ion Etching (DRIE) repeatedly integrates isotropic silicon etching and passivation steps. With the help of a high-density plasma ...

Oxford Instruments Plasma Technology PlasmaPro 100 Cobra 300 ICP RIE ALE The Oxford Instruments Cobra is perhaps the highest performance R&D etch system in the academic world. Our system is configured ...