To store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...

To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...

Plasma etching and atomic layer etching (ALE) are critical processes in the fabrication of semiconductor devices, particularly as the industry moves towards smaller and more complex structures.

This groundbreaking technique, also referred to as MacEtch or MACE, provides ultra-high anisotropy etching that’s free from damage. It is an innovative approach that effectively addresses the ...

In a conventional plasma etching chamber, the incident ions bombard the surface and etch holes normal to the surface; angled etching is not possible even when the surface is tilted. To overcome ...

The narrow, deep holes required for one type of flash memory are made twice as fast with the right recipe, which includes a plasma made from hydrogen fluoride.

AlixLabs AB, a Swedish semiconductor startup specialising in Atomic Layer Etching (ALE), announces that it has entered a ...

Advancements and Projections in the Global DC Plasma Excitations Market: Insights, Trends, Opportunities, and Recent DevelopmentsNew York, Jan. 27, 2025 (GLOBE NEWSWIRE) -- Overview The Global DC ...

The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. “Cryo etch with the hydrogen fluoride plasma ...