Plasma etching and atomic layer etching (ALE) are critical processes in the fabrication of semiconductor devices, particularly as the industry moves towards smaller and more complex structures.

To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...

Research has also delved into the use of plasma techniques for atomic layer etching. For example, a study on molybdenum etching involved a two-step process of plasma oxidation followed by ...

Researchers at the University at Albany’s College of Nanotechnology, Science, and Engineering now have access to a new fabrication system capable of manipulating microchip designs at the atomic level.

To store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...

What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...

there is a need for ever more precise process control to create and manipulate these layers. The PlasmaPro 100 ALE offers this by improving the Cobra ICP platform along with specialized hardware for ...

Installation of plasma deposition tool at chip research manufacturing line is part of $10 million in upgrades to R&D ...

Researchers at Shandong University in China have reported an enhancement-mode P-GaN/AlGaN/GaN metal-insulator-semiconductor ...

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The result is a new generation ALD platform capable of doing thermal as well as plasma-enhanced deposition. Cambridge NanoTech has combined its leading ALD expertise with advanced Computational Fluid ...

Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...