From the last several lithography nodes, in the 14 to 10nm range, to the latest nodes, in the 7 to 5nm range, the requirements for patterning and image transfer materials have increased dramatically.

The Orion III PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The ...

Much progress has been made in growing large-area graphene by means of thermal chemical vapour deposition (CVD) based on catalytic dehydrogenation of carbon precursors on copper 1,2,3,4. However, in ...

Swiss-based PV manufacturing equipment specialist INDEOtec SA has successfully gained tool acceptance for its PECVD process tools from both Fraunhofer ISE and the King Abdullah University of Science ...

Further two InPassion ALD systems were shipped. Both systems will be installed at solar cell manufacturers, already working with PECVD AlOx for several years. The repeat order is coming from one of ...

To reduce semiconductor manufacturing cycle time in the fab, there are two options: either increase capacity or shorten the process time. Because memory makers are particularly feeling the pain in ...

The new product, Singular, is applied more and more for the development of PECVD coatings for high efficiency solar cells following conventional and new cell concepts. Singular is a modular tool, ...

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...