OSAKA, Japan — Mitsubishi Electric Corp. has developed a single-step, hydrofluoric acid electrochemical etching process that can achieve an aspect ratio greater than 60:1 at potentially a tenth of the ...

When the mask is parallel to the path of the ion, all unmasked regions can be etched. Thus, ion beam etching is limited to etching line shaped masks of arbitrarily long lengths. Fig. 1: (1a) Physical ...

Prepare to be amazed by the incredible restoration of this rusty hammer as it gets transformed into a masterpiece. What happens when a worn-out hammer meets expert techniques like sandblasting, ...

Lam Research has been talking about ALE. Basically, the company is implementing more of a traditional and sequential ALE process. For this, the desired chemistry is first pumped into a chamber and ...

The etching step is also self-limiting, as it stops once the modified layer is completely removed, exposing the underlying unmodified material. These two steps are repeated in a cyclic manner until ...

FREMONT, Calif.–Lam Research Corp. today announced what the company says it the industry's first etch platform series capable of handling both 200- and 300-mm wafers as well as a wide range of process ...

This step includes undercutting. The photochemical process’s footprint will be larger than the intended pattern when it takes effect. Therefore, the digital drawing and photo tool must be larger than ...

In addition to monitoring the etching process, the light catalyzes the etching process itself, called photochemical etching. Traditional chemical etching creates features in steps or plateaus.

Nanoplas has announced a new dry-etch process offering virtually unlimited etch selectivity for removing dielectric films on microprocessors and memories at high throughput. Nanoplas’s new ...