The integration of dopant activation and annealing techniques in silicon epitaxy represents a pivotal advancement in semiconductor fabrication. Through methods such as ion implantation combined with ...

During an email interview, Atomera founder and CTO Robert Mears discussed how dopant diffusion affects chipmaking and options for delving into the dopant diffusion process to accomplish ...

BOLINGBROOK, Ill.--(BUSINESS WIRE)--Sivananthan Laboratories Inc., a high-tech business incubator and national leader in crystalline cadmium telluride (CdTe)-based solar cell technology, announced ...

An international team of researchers has demonstrated a novel solvent process for pure and highly crystalline 2D perovskites, which they demonstrated in 2D/3D perovskite solar cells. A n-i-p champion ...

A p-n junction is an interface or boundary between p-type and n-type semiconductor materials within a single semiconductor crystal. The positive (p) side contains excess holes, while the negative (n) ...

Information about the Colorado Nanofabrication Lab facility. The DWL 66FS laser lithography system is an economical, high resolution pattern generator for low volume mask making and direct writing.